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Sputtering equipment - Shibaura Mechatronics CFS-8EP-55

Product Specifications

Maker Shibaura Mechatronics

Model CFS-8EP-55

Category Semiconductor (Pre-process)

Model year 2001

External Dimensions 1300x1100x1500

Condition Used

Showroom Information

Exhibition hall Enzan Technical Center

Price & Inquiry

price Price Inquiry

Inquiry Number L70733

Mechanical Specifications

Down sputtering method: 3 types available

2-inch ceramic substrate (φ300 effective area)

Film thickness distribution within R150mm from the center

Magnetron sputter down

DC co-sputtering and layered film deposition possible

Lamp heating method: Maximum 350℃, normal temperature: 300℃

Vacuum chamber inner dimensions φ550x380H SUS304

Film forming material Pt Au Ti

3φ200V 50Hz 25KVA

Specifications available

Attachments

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Product Overview

Shibaura Mechatronics CFS-8EP-55 is a used Semiconductor (Pre-process) item handled by ASKINDEX Korea. External dimensions: 1300x1100x1500. This listing has sold, but you can ask about restock or a similar unit, and request a quote. You can also compare other used products from the same manufacturer (Shibaura Mechatronics) and the same category (Semiconductor (Pre-process)).

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Shibaura Mechatronics CFS-8EP-55 Sputtering equipment - ASKINDEX Korea

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  • Shibaura Mechatronics CFS-8EP-55 Sputtering equipment Detail Image - ASKINDEX Korea
  • Shibaura Mechatronics CFS-8EP-55 Sputtering equipment Detail Image - ASKINDEX Korea
  • Shibaura Mechatronics CFS-8EP-55 Sputtering equipment Detail Image - ASKINDEX Korea
  • Shibaura Mechatronics CFS-8EP-55 Sputtering equipment Detail Image - ASKINDEX Korea
  • Shibaura Mechatronics CFS-8EP-55 Sputtering equipment Detail Image - ASKINDEX Korea
  • Shibaura Mechatronics CFS-8EP-55 Sputtering equipment Detail Image - ASKINDEX Korea