Sputtering Equipment - Canon Anelva E-402S
Product Specifications
Maker Canon Anelva
Model E-402S
Category Semiconductor (Pre-process)
Model year 2008
External Dimensions 2150x2250x2200
Condition Used
Showroom Information
Exhibition hall Kyushu Technical Center
Price & Inquiry
price Price Inquiry
Inquiry Number L70777
Mechanical Specifications
Workpiece: Φ8in, Φ6in wafer
Equipment configuration: LL room → Traverser room → SP1 room on the left and right, SP2 room
Sputtering chamber: W580xL980xH305mm (external dimensions)
Sputter-up method
Cathode φ317mm RMC for non-magnetic materials, 1 unit in each SP room
Target dimensions: approx. φ310x5t
Holder Shape
φ370mm heating holder with heat conduction gas mechanism, reverse sputtering possible
Up and down stroke: approx. 200mm
Distance between electrodes: approx. 50mm to 250mm
Sputtering power supply
DC power supply 3.0Kw RF power supply 5.0Kw 600W
3φ200V 50/60Hz 150A
Attachments
Product Overview
Canon Anelva E-402S is a used Semiconductor (Pre-process) item handled by ASKINDEX Korea. External dimensions: 2150x2250x2200. This listing has sold, but you can ask about restock or a similar unit, and request a quote. You can also compare other used products from the same manufacturer (Canon Anelva) and the same category (Semiconductor (Pre-process)).
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