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Plasma CVD equipment - ULVAC CC-200(SiH4)

Product Specifications

Maker ULVAC

Model CC-200(SiH4)

Category Semiconductor (Pre-process)

Model year 2007

External Dimensions W約800 D2300 H2000(本体)W1000 D1000 H1200(ドライポンプ+メカニカルブースターポンプ)W800 D550 H1600(キャビネット型除害塔)

Condition Used

Showroom Information

Exhibition hall Kyushu Technical Center

Price & Inquiry

price Price Inquiry

Inquiry Number P31178

Mechanical Specifications

Power supply: φ3 200V 15kVA

High frequency power supply: 27.12MHz 0.5kw

Transport tray size: 25cm x 25cm

Substrate size: 3 inch x 5 pieces (1 batch)

Gas type: O2/100ccm SiH4/Ar(20%)/250ccm CF4/500ccm

NH3/200ccm N2/1000ccm

N2O/2000ccm N2O/500ccm

Exhaust system: Mechanical booster pump + dry pump

Harm removal equipment: VEGACLEAN JGS45S type Taiyo Nippon Sanso

W1000 D1000 H1200 (Dry pump + mechanical booster pump) W800 D550 H1600 (Cabinet type detoxification tower)

Attachments

Product Overview

ULVAC CC-200(SiH4) is a used Semiconductor (Pre-process) item handled by ASKINDEX Korea. External dimensions: W約800 D2300 H2000(本体)W1000 D1000 H1200(ドライポンプ+メカニカルブースターポンプ)W800 D550 H1600(キャビネット型除害塔). This listing has sold, but you can ask about restock or a similar unit, and request a quote. You can also compare other used products from the same manufacturer (ULVAC) and the same category (Semiconductor (Pre-process)).

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ULVAC CC-200(SiH4) Plasma CVD equipment - ASKINDEX Korea

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  • ULVAC CC-200(SiH4) Plasma CVD equipment Detail Image - ASKINDEX Korea
  • ULVAC CC-200(SiH4) Plasma CVD equipment Detail Image - ASKINDEX Korea
  • ULVAC CC-200(SiH4) Plasma CVD equipment Detail Image - ASKINDEX Korea
  • ULVAC CC-200(SiH4) Plasma CVD equipment Detail Image - ASKINDEX Korea
  • ULVAC CC-200(SiH4) Plasma CVD equipment Detail Image - ASKINDEX Korea
  • ULVAC CC-200(SiH4) Plasma CVD equipment Detail Image - ASKINDEX Korea