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Focused ion beam (FIB) system - Hitachi High-Tech FB-2100

Product Specifications

Maker Hitachi High-Tech

Model FB-2100

Category Semiconductor (Post-process)

Model year 2007

External Dimensions W820 D890 H1530

Condition Used

Showroom Information

Exhibition hall Enzan Technical Center

Price & Inquiry

price Price Inquiry

Inquiry Number Q50053

Machine specifications

Acceleration voltage: 10-40kV variable (5kV steps)

Maximum beam current: 60nA or more

Maximum beam current density: 50 A/cm² or higher

Image resolution (SIM image): 6nm (acceleration voltage 40kV, WD 5.62mm)

Magnification (SIM image): 700 to 90,000 times (WD5.62mm)

Machining at a specified location: Microsampling method

Attached file

Product Overview

Hitachi High-Tech FB-2100 is a used Semiconductor (Post-process) item handled by ASKINDEX Korea. External dimensions: W820 D890 H1530. This listing has sold, but you can ask about restock or a similar unit, and request a quote. You can also compare other used products from the same manufacturer (Hitachi High-Tech) and the same category (Semiconductor (Post-process)).

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Hitachi High-Tech FB-2100 Focused ion beam (FIB) system - ASKINDEX Korea

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  • Hitachi High-Tech FB-2100 Focused ion beam (FIB) system Detail Image - ASKINDEX Korea
  • Hitachi High-Tech FB-2100 Focused ion beam (FIB) system Detail Image - ASKINDEX Korea
  • Hitachi High-Tech FB-2100 Focused ion beam (FIB) system Detail Image - ASKINDEX Korea
  • Hitachi High-Tech FB-2100 Focused ion beam (FIB) system Detail Image - ASKINDEX Korea
  • Hitachi High-Tech FB-2100 Focused ion beam (FIB) system Detail Image - ASKINDEX Korea
  • Hitachi High-Tech FB-2100 Focused ion beam (FIB) system Detail Image - ASKINDEX Korea